_By applying X-rays that generated by an X-ray tube, the energy specific
to the elements contained in the sample is generated. _These X-rays are detected by a Si-semiconductor detector. It examines
the type of constituent elements of the sample and the composition of
elements roughly. _This is a non-destructive analysis method and it enables rapid elemental
analysis of solids and powders.
fig.1 Principle of XRF-EDX
_When an atom is irradiated with X-rays, the electrons are ejected from the inner orbit. Outer shell electrons fall into the orbit of the inner shell. _At that time, X-rays (characteristic X-rays) corresponding to the energy difference between the two orbits are emitted. This characteristic X-ray is unique to each element, so that you can know the type of element.
fig.2 Sample installation
fig.3 Sketch of sample installation
_Place the sample in the sample chamber of 460 (W) mm × 360 (D) mm × 150 (H) mm and X-ray is irradiated from the bottom.
fig.4 XGT-1000WR (HORIBA)
■Application (e.g.)
◆RoHS rough quantitative analysis (Cd, Pb, Cr, Hg, Br)
◆Analysis of main element of materials
◆Analysis of foreign materials with a size of several mm
◆Elemental analysis of 14Si ~ 92U with a detection limit of 0.1 % – 1 %
to the elements contained in the sample is generated.
_These X-rays are detected by a Si-semiconductor detector. It examines
the type of constituent elements of the sample and the composition of
elements roughly.
_This is a non-destructive analysis method and it enables rapid elemental
analysis of solids and powders.
_At that time, X-rays (characteristic X-rays) corresponding to the energy difference between the two orbits are emitted. This characteristic X-ray is unique to each element, so that you can know the type of element.
◆Analysis of main element of materials
◆Analysis of foreign materials with a size of several mm
◆Elemental analysis of 14Si ~ 92U with a detection limit of 0.1 % – 1 %